Thickness measurement of silicon films using 14 MeV neutrons

S. Jayanthakumar; V. Bhoraskar

doi:10.1007/bf02165414

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Journal of Radioanalytical and Nuclear Chemistry

Volume/Issue:: Volume 104: Issue 1

Thickness measurement of silicon films using 14 MeV neutrons

Authors:

S. Jayanthakumar

S. Jayanthakumar University of Poona Department of Physics 411 007 Pune India

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and

V. Bhoraskar

V. Bhoraskar University of Poona Department of Physics 411 007 Pune India

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Pages:: 1–6

Online Publication Date:: 29 Sep 2005

Publication Date:: 17 Mar 1986

Article Category:: Research Article

DOI:: https://doi.org/10.1007/bf02165414

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Abstract

14 MeV neutron activation analysis technique is used to estimate thickness of silicon films deposited on glass plates. The elemental barium present in the glass plate was used as an internal monitor. Measured values of film thickness are in agreement within ±5% with the results obtained by weight method.

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Journal of Radioanalytical and Nuclear Chemistry

Print ISSN:: 0236-5731

Online ISSN:: 1588-2780

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Journal of Radionalytical and Nuclear Chemistry
Language	English
Size	A4
Year of Foundation	1968
Volumes per Year	1
Issues per Year	12
Founder	Akadémiai Kiadó
Founder's Address	H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
Publisher	Akadémiai Kiadó Springer Nature Switzerland AG
Publisher's Address	H-1117 Budapest, Hungary 1516 Budapest, PO Box 245. CH-6330 Cham, Switzerland Gewerbestrasse 11.
Responsible Publisher	Chief Executive Officer, Akadémiai Kiadó
ISSN	0236-5731 (Print)
ISSN	1588-2780 (Online)