Authors:
R. Amano Kanazawa University School of Allied Medical Professions Kodatsuno 5-11-80 920 Kanazawa Japan

Search for other papers by R. Amano in
Current site
Google Scholar
PubMed
Close
and
Y. Shiokawa Tohoku Univesity Institute of Materials Research Katahira 2-1-1, Aoba-ku 980 Sendai Japan

Search for other papers by Y. Shiokawa in
Current site
Google Scholar
PubMed
Close
Restricted access

Abstract  

Preparation of thin films of lanthanide (Ln) sulfides has been studied by the chemical vapor deposition (CVD) method, using metal -diketonato chelates with 2,2,6,6-tetramethyl-3,5-heptanedione and reactant H2S gas as starting materials. Two kinds of sulfides, Ln2O2S oxysulfides and EuS monosulfide, were obtained as thin films at temperatures as low as 390–570 °C. The CVD method was confirmed to be suited for the above purpose.

  • Collapse
  • Expand

To see the editorial board, please visit the website of Springer Nature.

Manuscript Submission: HERE

For subscription options, please visit the website of Springer Nature.

Journal of Radionalytical and Nuclear Chemistry
Language English
Size A4
Year of
Foundation
1968
Volumes
per Year
1
Issues
per Year
12
Founder Akadémiai Kiadó
Founder's
Address
H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
Publisher Akadémiai Kiadó
Springer Nature Switzerland AG
Publisher's
Address
H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
CH-6330 Cham, Switzerland Gewerbestrasse 11.
Responsible
Publisher
Chief Executive Officer, Akadémiai Kiadó
ISSN 0236-5731 (Print)
ISSN 1588-2780 (Online)