Journal of Radioanalytical and Nuclear Chemistry
Volume/Issue:
Volume 155: Issue 3
Preparation of lanthanide sulfide films by chemical vapor deposition using β-diketone chelates
Authors:
R. Amano Kanazawa University School of Allied Medical Professions Kodatsuno 5-11-80 920 Kanazawa Japan

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Y. Shiokawa Tohoku Univesity Institute of Materials Research Katahira 2-1-1, Aoba-ku 980 Sendai Japan

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Pages:
201–210
Online Publication Date:
27 Sep 2005
Publication Date:
17 Oct 1991
Article Category:
Research Article
DOI:
https://doi.org/10.1007/bf02166645
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Abstract  

Preparation of thin films of lanthanide (Ln) sulfides has been studied by the chemical vapor deposition (CVD) method, using metal -diketonato chelates with 2,2,6,6-tetramethyl-3,5-heptanedione and reactant H2S gas as starting materials. Two kinds of sulfides, Ln2O2S oxysulfides and EuS monosulfide, were obtained as thin films at temperatures as low as 390–570 °C. The CVD method was confirmed to be suited for the above purpose.

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Cover Journal of Radioanalytical and Nuclear Chemistry
Journal of Radioanalytical and Nuclear Chemistry
Print ISSN:
0236-5731
Online ISSN:
1588-2780

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Journal of Radionalytical and Nuclear Chemistry
Language English
Size A4
Year of
Foundation		 1968
Volumes
per Year		 1
Issues
per Year		 12
Founder Akadémiai Kiadó
Founder's
Address		 H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
Publisher Akadémiai Kiadó
Springer Nature Switzerland AG
Publisher's
Address		 H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
CH-6330 Cham, Switzerland Gewerbestrasse 11.
Responsible
Publisher		 Chief Executive Officer, Akadémiai Kiadó
ISSN 0236-5731 (Print)
ISSN 1588-2780 (Online)

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