Determination of ion dose and profiles in 74Ge and 120Sn implanted silicon layers by PIXE, NAA, RBS and SIMS

B. Belin; P. Bode; R. Turan; Th. Van Meerten

doi:10.1023/b:jrnc.0000034889.71332.26

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Journal of Radioanalytical and Nuclear Chemistry

Volume/Issue:: Volume 261: Issue 2

Determination of ion dose and profiles in ⁷⁴Ge and ¹²⁰Sn implanted silicon layers by PIXE, NAA, RBS and SIMS

Authors:

B. Belin

B. Belin Istanbul Technical University Department of Physics, Faculty of Science and Letters 80626 Maslak, Istanbul Turkey

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P. Bode

P. Bode Delft University of Technology Interfaculty Reactor Institute Mekelweg 15 2629JB Delft The Netherlands

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R. Turan

R. Turan Middle East Technical University Ankara Turkey

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, and

Th. Van Meerten

Th. Van Meerten Delft University of Technology Interfaculty Reactor Institute Mekelweg 15 2629JB Delft The Netherlands

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Pages:: 479–483

Online Publication Date:: 03 Nov 2004

Publication Date:: 17 Aug 2004

Article Category:: Research Article

DOI:: https://doi.org/10.1023/b:jrnc.0000034889.71332.26

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Abstract

Implanted ⁷⁴Ge and ¹²⁰Sn concentrations in silicon (Si) layers were investigated by particle induced X-ray emission (PIXE), instrumental neutron activation analysis (INAA), Rutherford backscattering spectrometry (RBS) and secondary ion mass spectrometry (SIMS). Slight differences were observed in the results obtained. It was shown that PIXE and INAA are as powerful as the traditional RBS and SIMS spectroscopy for the investigation of thin layered Si.

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Journal of Radioanalytical and Nuclear Chemistry

Print ISSN:: 0236-5731

Online ISSN:: 1588-2780

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Journal of Radionalytical and Nuclear Chemistry
Language	English
Size	A4
Year of Foundation	1968
Volumes per Year	1
Issues per Year	12
Founder	Akadémiai Kiadó
Founder's Address	H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
Publisher	Akadémiai Kiadó Springer Nature Switzerland AG
Publisher's Address	H-1117 Budapest, Hungary 1516 Budapest, PO Box 245. CH-6330 Cham, Switzerland Gewerbestrasse 11.
Responsible Publisher	Chief Executive Officer, Akadémiai Kiadó
ISSN	0236-5731 (Print)
ISSN	1588-2780 (Online)