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  • 1 Department of Chemistry and Biochemistry, Florida State University Tallahassee, FL-32306, USA
  • 2 Department of Chemistry and Biochemistry, Florida State University Tallahassee, FL-32306, USA; On leave from Radiochemistry Division, Bhabha Atomic Research Centre, Trombay, Mumbai -400 085, India
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Summary  

Sorption of nickel, Ni2+, on SiO2 . xH2O (silica gel) has been studied as a function of time conditions: amount of silica gel: 0.10-1.00 g, nickel concentration: 5.00 . 10-5-1.20 . 10-3M, ionic strength: 0.20-1.40M NaClO4, pH 6.50 to 8.50, and temperature 273-318 K. From the kinetic data, the diffusion coefficient of Ni2+ ion was calculated to be 1.28(±0.07) . 10-11 m2 . s-1 under particle diffusion-controlled conditions. The sorption rate was determined as 3.79(±0.35) . 10-3 s-1 at 298 K, pH 8.40 in 0.20M (NaClO4). The sorption data were fitted to Freundlich, Langmuir and Dubinin-Radushkevich (D-R) isotherms. Nickel sorption on 0.20 g silica gel decreased with ionic strength from 77.70±0.70% (0.20M NaClO4) to 16.12±0.37% (1.40M NaClO4) at intial pH of 8.50±0.05. A gradual decrease in pH with increasing ionic strength suggests an ion exchange mechanism and the sorption of Ni2+ on silica gel increasing with temperature indicates an endothermic enthalpy. The effect of different ligands such as fluoride, carbonate, phosphate and oxalate on Ni2+ sorption on silica gel was studied.