Thick silver electrodeposition on copper substrate for 109Cd production

M. Mirzaee; M. Sadeghi; Z. Gholamzadeh; Shapour Lahouti

doi:10.1007/s10967-007-7161-8

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Journal of Radioanalytical and Nuclear Chemistry

Volume/Issue:: Volume 277: Issue 3

Thick silver electrodeposition on copper substrate for ¹⁰⁹Cd production

Authors:

M. Mirzaee

M. Mirzaee Medical & Industrial Research School Nuclear Medicine Research Group, Agricultural P.O. Box 31485/498 Karaj Iran

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M. Sadeghi

M. Sadeghi

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Z. Gholamzadeh

Z. Gholamzadeh Islamic Azad University Faculty of Engineering, Research and Science Campus Tehran Iran

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Shapour Lahouti

Shapour Lahouti Nuclear Science and Technology Research Institute Advanced Material Research Group, Material Research School Karaj Iran

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Pages:: 645–650

Online Publication Date:: 18 Apr 2008

Publication Date:: 01 Sep 2008

Article Category:: Research Article

DOI:: https://doi.org/10.1007/s10967-007-7161-8

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Abstract

Silver electrodeposition on copper substrate was investigated for production of ¹⁰⁹Ca. The electrodeposition experiments were carried out by the alkaline plating baths. The optimum conditions of the electrodeposition of silver were: 4.1 g/1 silver, pH 10–12, DC current density of ca. 4.27 mA·cm⁻² at 40–50 °C temperature with 100% current efficiency.

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Journal of Radioanalytical and Nuclear Chemistry

Print ISSN:: 0236-5731

Online ISSN:: 1588-2780

Journal of Radionalytical and Nuclear Chemistry
Language	English
Size	A4
Year of Foundation	1968
Volumes per Year	1
Issues per Year	12
Founder	Akadémiai Kiadó
Founder's Address	H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
Publisher	Akadémiai Kiadó Springer Nature Switzerland AG
Publisher's Address	H-1117 Budapest, Hungary 1516 Budapest, PO Box 245. CH-6330 Cham, Switzerland Gewerbestrasse 11.
Responsible Publisher	Chief Executive Officer, Akadémiai Kiadó
ISSN	0236-5731 (Print)
ISSN	1588-2780 (Online)