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  • 1 Institute of Physical and Chemical Research Wako-shi, Saitama (Japan)
  • | 2 Komatsu Electronic Metals Co. Shinomiya, Hiratsuka (Japan)
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Abstract  

High utility value of charged-particle activation analysis is exemplified by the study on carbon, nitrogen and oxygen in semiconductor silicon. A summary of the present authors' works is shown, and the equilibrium of carbon and oxygen in a silicon melt with ambient carbon monoxide is discussed. Also, a note is given about the chemical separation of18F for the3He activation analysis of various matrices.