Authors:
W. Rudolph Central Institute of Nuclear Research Rossendorf 8051 Dresden (GDR)

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C. Bauer Central Institute of Nuclear Research Rossendorf 8051 Dresden (GDR)

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P. Gippner Central Institute of Nuclear Research Rossendorf 8051 Dresden (GDR)

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D. Grambole Central Institute of Nuclear Research Rossendorf 8051 Dresden (GDR)

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C. Heiser Central Institute of Nuclear Research Rossendorf 8051 Dresden (GDR)

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F. Herrmann Central Institute of Nuclear Research Rossendorf 8051 Dresden (GDR)

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H. Thomas Central Institute of Nuclear Research Rossendorf 8051 Dresden (GDR)

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Abstract  

Hydrogen surface contamination and depth profiles can be measured by the resonant nuclear reactions1H(19F, )16O and1H(15N, )12C. The method was applied to study hydrogen-implanted silicon, amorphous silicon layers and silicon oxide films produced by anodic oxidation.

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Journal of Radionalytical and Nuclear Chemistry
Language English
Size A4
Year of
Foundation
1968
Volumes
per Year
1
Issues
per Year
12
Founder Akadémiai Kiadó
Founder's
Address
H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
Publisher Akadémiai Kiadó
Springer Nature Switzerland AG
Publisher's
Address
H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
CH-6330 Cham, Switzerland Gewerbestrasse 11.
Responsible
Publisher
Chief Executive Officer, Akadémiai Kiadó
ISSN 0236-5731 (Print)
ISSN 1588-2780 (Online)