Journal of Thermal Analysis and Calorimetry
Volume/Issue:
Volume 103: Issue 1
Reactive diffusion in W–Mo–Si thin films
Authors:
A. Derafa Institut Matériaux Microélectronique et Nanosciences de Provence, IM2NP, UMR-CNRS 6242, Aix Marseille III University, cc. 142, St Jérôme, Av. Normandie-Niemen, 13397, Marseille Cedex 20, France
LCMI, Département de Physique, Université Constantine, Route Ain el bey, 25000, Constantine, Algerie
LP3M, Département d’Optique et Mécanique de Précision, Université Sétif, 19000, Sétif, Algerie

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M.-C. Record Institut Matériaux Microélectronique et Nanosciences de Provence, IM2NP, UMR-CNRS 6242, Aix Marseille III University, cc. 142, St Jérôme, Av. Normandie-Niemen, 13397, Marseille Cedex 20, France

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D. Mangelinck Institut Matériaux Microélectronique et Nanosciences de Provence, IM2NP, UMR-CNRS 6242, Aix Marseille III University, cc. 142, St Jérôme, Av. Normandie-Niemen, 13397, Marseille Cedex 20, France

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R. Halimi LCMI, Département de Physique, Université Constantine, Route Ain el bey, 25000, Constantine, Algerie

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A. Bouabellou LCMI, Département de Physique, Université Constantine, Route Ain el bey, 25000, Constantine, Algerie

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Pages:
111–116
Online Publication Date:
08 Dec 2010
Publication Date:
01 Jan 2011
Article Category:
Research Article
DOI:
https://doi.org/10.1007/s10973-010-1136-7
Keywords:
Thin films; Reactive diffusion; Silicides; Molybdenum; Tungsten
Restricted access

Abstract

This study reports the phase formation in the ternary thin films system Mo–W–Si. The metallic films were deposited onto Si (100) substrate by sputtering. Two kinds of samples were prepared, either by sequential deposition or by co-deposition. The phase formation was investigated by In situ X-ray diffraction measurements from 300 to 900 °C. The influence of the sample preparation, namely sequential deposition and co-deposition, on the mechanism of phase formation has been evidenced.

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Cover Journal of Thermal Analysis and Calorimetry
Journal of Thermal Analysis and Calorimetry
Print ISSN:
1388-6150
Online ISSN:
1572-8943

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Journal of Thermal Analysis and Calorimetry
Language English
Size A4
Year of
Foundation		 1969
Volumes
per Year		 1
Issues
per Year		 24
Founder Akadémiai Kiadó
Founder's
Address		 H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
Publisher Akadémiai Kiadó
Springer Nature Switzerland AG
Publisher's
Address		 H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
CH-6330 Cham, Switzerland Gewerbestrasse 11.
Responsible
Publisher		 Chief Executive Officer, Akadémiai Kiadó
ISSN 1388-6150 (Print)
ISSN 1588-2926 (Online)

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