Complexes of ruthenium(III) with the following beta-diketone derivatives: 2,4-pentanedione (Ru(acac)3), 1,1,1,6,6,6-hexafluoro-2,4-pentanedione (Ru(hfac)3), and 2-methoxy-2,6-dimethyl-3,5-heptanedione (Ru(mdhd)3) were synthesized, purified, and identified by chemical analysis and melting points. By difference-scanning calorimetry (DSC) in vacuum the thermodynamic characteristics of melting processes were defined. Using the static method with quartz membrane zero-manometer, the temperature dependencies of saturated and unsaturated vapor pressure were obtained for Ru(hfac)3. The standard thermodynamic characteristics of vaporization processes enthalpy ΔHT* and entropy ΔS°T* were determined.
1. Shibutami, T, Kawano, K, Oshima, N, Yokoyama, Sh, Funakubo, H 2003 Ruthenium film with high nuclear density deposited by MOCVD using a novel liquid precursor. Electrochem Solid-State Lett. 6:C117–C119 .
2. Kim, HW, Ju, B-S, Kang, C-J 2008 Patterning of Ru electrode in O2/Cl2 gasus in reactive ion etcher. Vacuum. 71:481–486 .
3. Joo, J-H, Seon, J-M, Jeon, Y-C, Oh, K-Y, Roh, J-S, Kim, J-J, Choi, J-T 1998 Investigation of ruthenium electrodes for (Ba, Sr)TiO3 thin films. Jpn J Appl Phys. 37:3396–3401 .
4. Morozova, NB, Zharkova, GI, Semyannikov, PP, Sysoev, SV, Igumenov, IK, Fedotova, NE, Gelfond, NV 2001 MO CVD obtaining composite coating from metal of platinum group on titanium electrodes. J Phys. 11 Pr3 609–616.
5. Cheng AHB , Daniels M, Luttmer JD. Etching Byproducts of Ruthenium Wafers Using Various Etching Chemistries. In: Simpson SR, Mendicino L, Rajeshwar K, Fenton JM, editors. Environmental issues in the electronics/semiconductor industries and Electrochemical/photochemical methods for pollution. Penington: The Electrochemical Society; 1998. pp. 10–4.
6. Lemon, TH 1973 Thick-film ruthenium resistor pastes. New compositions for screen-printed circuits. Platinum Metals Rev. 17:14–20.
7. Metal Bulletin Monthly. 2007; October:44–5.
8. Hendrix BC , Welch JJ, Roeder JF, Wang Z, Xu Ch, Stawasz M, Baum Th. Ultra-thin ruthenium films by pulsed chemical vapor deposition. In: Kar S, De Gendt S, Haussa M, Landheer D, Misra D, Iwai H, editors. Physics and technology of high-k gate dielectrics 5. Penington: The Electrochemical Society; 2007. pp. 569–74.
9. Belyakov, AI 2006 Electrochemical supercapacitors: their state-of-the-art and design problems. Electrochem Energy 6:146–149.
10. Kim, BS, Kang, SY, Seo, HS, ChS, Hwang, Kim, HJ 2007 Improved nucleation behavior of Ru thin films prepared by MOCVD on TiCl4 pretreated substrates. Electrochem Solid State Lett. 10:D113–D115 .
11. Lai, Y-H, Chou, T-Y, Song, Y-H, Liu, Ch-Sh, Chi, Y, Carty, AJ, Peng Sh, M, Lee, G-H 2003 Synthesis and characterization of ruthenium complexes with two fluorinated amino alkoxide chelates. The quest to design suitable MOCVD source reagents. J Chem Mater. 15:2454–2462 .
12. Igumenov, IK, Semyannikov, PP, Trubin, SV, Morozova, NB, Gelfond, NV, Mischenko, AV, Norman, JA 2007 Approach to control deposition of ultra thin films from metal organic precursors: Ru deposition. Surf Coat Technol. 201:9003–9008 .
13. Lee, F-J, Chi, Y, Liu, Ch-Sh, Hsu, P-F, Chou, T-Y, Peng, Sh-M, Lee, G-H 2001 Organometallic ruthenium source reagents for CVD. Chem Vapor Depos. 7:99–101 .
14. Aaltonen, T, Ritala, M, Arstila, K, Keinonen, J, Leskelä, M 2004 Atomic layer deposition of ruthenium thin films from Ru(thd)3 and oxygen. Chem Vapor Depos. 10:215–219 .
15. Lashdaf, M, Hatanpää, T, Krause, AOI, Lahtinen, J, Lindblad, M, Tiitta, M 2003 Deposition of palladium and ruthenium β-diketonates on alumina and silica supports in gas and liquid phase. J Appl Catal A. 241:51–63 .
16. Lashdaf, M, Hatanpää, T, Tiitta, M 2001 Volatile β-diketonato complexes of ruthenium, palladium and platinum. Preparation and thermal characterization. J Therm Anal Calorim. 64:1171–1182 .
17. Bykov, AF, Morozova, NB, Igumenov, IK, Sysoev, SV 1996 Investigation of thermal properties of ruthenium(III) beta-diketonate precursors for preparation of RuO2 films by CVD. J Therm Anal. 46:1551–1565 .
18. Morozova, NB, Zherikova, KV, Semyannikov, PP, Trubin, SV, Igumenov, IK 2009 Thermal properties of ruthenium(III) β-diketonates. J Therm Anal Calorim. 98:395–399 .
19. Sysoev, SV, Cheremisina, TN, Zelenina, LN, Tkachev, SV, Zherikova, KV, Morozova, NB, Kuratieva, NV 2010 Thermodynamic characteristics of phase conversion of structural isomers for volatile complex of ruthenium (III) trifluoroacetylacetonate. J Therm Anal Calorim. 101:41–44 .
20. Morozova, NB, Mit’kin, VN, Igumenov, IK, Zemskov, SV, Potapova, OG 1989 Ruthenium β-diketonates. Koord Khim. 15:67–72.
21. Suvorov, AV 1970 Thermodynamic Chemistry of the Vapor State Nauka Leningrad.
22. Zelenina, LN, Titov, VA, Chusova, TP, Stenin, YuG, Titov, AA 2003 On the thermodynamic properties of germanium-iodide compounds. J Chem Thermodyn. 35:1601–1612 .
23. Ribeiro da Silva, MAV, Monte, MJS, Giera, E 2001 Thermodynamic study of the sublimation of crystalline tris(1,1,1-trifluoro-2,4-pentanedionate)ruthenium(III) and tris(1,1,1,5,5,5-hexafluoro-2,4-pentanedionate)ruthenium(III). J Chem Thermodyn. 33:369–376 .