Processing thin films for advanced applications, for instance in electronics and optoelectronics, involves several steps starting
from precursor synthesis and ending up with the devices. Especially when optimizing the first steps of this chain of processes,
thermoanalytical techniques play an important role. The review will focus on the main chemical deposition methods (CVD, ALE,
spray pyrolysis, sol-gel) giving selected examples of problem-solving by thermal analysis. The techniques discussed are TG,
DTA/DSC, EGA and their combinations. High-temperature X-ray diffraction (HTXRD) is also a powerful tool for in situ studies
of thin films. The examples are taken from solar cell, superconductor and flat panel electroluminescent display technologies.