Authors:
A. Niskanen University of Helsinki Department of Chemistry, Laboratory of Inorganic Chemistry P.O. Box 55 FIN-00014 Helsinki Finland P.O. Box 55 FIN-00014 Helsinki Finland

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T. Hatanpää University of Helsinki Department of Chemistry, Laboratory of Inorganic Chemistry P.O. Box 55 FIN-00014 Helsinki Finland P.O. Box 55 FIN-00014 Helsinki Finland

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M. Ritala University of Helsinki Department of Chemistry, Laboratory of Inorganic Chemistry P.O. Box 55 FIN-00014 Helsinki Finland P.O. Box 55 FIN-00014 Helsinki Finland

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M. Leskelä University of Helsinki Department of Chemistry, Laboratory of Inorganic Chemistry P.O. Box 55 FIN-00014 Helsinki Finland P.O. Box 55 FIN-00014 Helsinki Finland

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Abstract  

Normal pressure thermogravimetry (TG) measurements were used to study the sublimation behavior of several volatile metal compounds, used as metal precursors in thin film fabrication by chemical vapor phase methods, like atomic layer deposition (ALD) and chemical vapor deposition (CVD). The results indicated that dynamic TG measurements may be used to find correct source temperatures to be used in an ALD reactor: a good correlation between the source temperatures used in ALD and temperatures corresponding to mass losses of 10 and 50% in TG was verified. It was also found that isothermal TG measurements offer a simple way for the vapor pressure measurements which otherwise are not trivial for solids with only moderate volatility.

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Journal of Thermal Analysis and Calorimetry
Language English
Size A4
Year of
Foundation
1969
Volumes
per Year
1
Issues
per Year
24
Founder Akadémiai Kiadó
Founder's
Address
H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
Publisher Akadémiai Kiadó
Springer Nature Switzerland AG
Publisher's
Address
H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
CH-6330 Cham, Switzerland Gewerbestrasse 11.
Responsible
Publisher
Chief Executive Officer, Akadémiai Kiadó
ISSN 1388-6150 (Print)
ISSN 1588-2926 (Online)

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