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  • 1 National Metal and Materials Technology Center (MTEC) Klong Luang Pathumthani Thailand 12120 114 Paholyothin Road, Klong 1 Klong Luang Pathumthani Thailand 12120 114 Paholyothin Road, Klong 1
  • | 2 Mahidol University Department of Chemistry, Faculty of Science Bangkok Thailand 10400 Rama VI Rd. Bangkok Thailand 10400 Rama VI Rd.
  • | 3 Tokyo Polytechnic University Department of Industrial Chemistry, Graduate School of Engineering Iiyama Atsugi Japan 243-0297 Iiyama Atsugi Japan 243-0297
  • | 4 College of Nihon University Department of Materials Chemistry and Engineering Tamura, Koriyama Japan 963-8642 Tamura, Koriyama Japan 963-8642
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Abstract  

Fluorine-doped tin dioxide (FTO) films were deposited on silicon wafers by inverted pyrosol technique using solutions with different doping concentration (F/Sn=0.00, 0.12, 0.75 and 2.50). The physical and electrical properties of the deposited films were analyzed by SEM, XRF, resistivity measurement by four-point-probe method and Hall coefficient measurement by van der Pauw method. The electrical properties showed that the FTO film deposited using the solution with F/Sn=0.75 gave a lowest resistivity of 3.210–4 ohm cm. The FTO films were analyzed by temperature programmed desorption (TPD). Evolved gases from the heated specimens were detected using a quadruple mass analyzer for mass fragments m/z, 1(H+), 2(H2+), 12(C+), 14(N+), 15(CH3+), 16(O+), 17(OH+ or NH3+), 18(H2O+ or NH4+), 19(F+), 20(HF+), 28(CO+ or N2+), 32(O2+), 37(NH4F+), 44(CO2+), 120(Sn+), 136(SnO+) and 152(SnO2+). The majority of evolved gases from all FTO films were water vapor, carbon monoxide and carbon dioxide. Fluorine (m/z 19) was detected only in doped films and its intensity was very strong for highly-doped films at temperature above 400C.

Manuscript Submission: HERE

  • Impact Factor (2019): 2.731
  • Scimago Journal Rank (2019): 0.415
  • SJR Hirsch-Index (2019): 87
  • SJR Quartile Score (2019): Q3 Condensed Matter Physics
  • SJR Quartile Score (2019): Q3 Physical and Theoretical Chemistry
  • Impact Factor (2018): 2.471
  • Scimago Journal Rank (2018): 0.634
  • SJR Hirsch-Index (2018): 78
  • SJR Quartile Score (2018): Q2 Condensed Matter Physics
  • SJR Quartile Score (2018): Q2 Physical and Theoretical Chemistry

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Journal of Thermal Analysis and Calorimetry
Language English
Size A4
Year of
Foundation
1969
Volumes
per Year
4
Issues
per Year
24
Founder Akadémiai Kiadó
Founder's
Address
H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
Publisher Akadémiai Kiadó
Springer Nature Switzerland AG
Publisher's
Address
H-1117 Budapest, Hungary 1516 Budapest, PO Box 245.
CH-6330 Cham, Switzerland Gewerbestrasse 11.
Responsible
Publisher
Chief Executive Officer, Akadémiai Kiadó
ISSN 1388-6150 (Print)
ISSN 1588-2926 (Online)

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